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Regular silicon pillars and dichroic filters produced via particle-imprinted membranes
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View: Figures


Image of FIG. 1.
FIG. 1.

(a) Preparation of the porous membrane: spreading of silica colloids and organic monomer on a water surface, polymerization and cross linking of the polymer, transfer of the hybrid membrane on a silicon substrate, and removal of the colloids; (b) creation of the gold mask: vapor deposition of gold onto the porous membrane, lift-off process using an adhesive tape, and removal of the porous membrane; (c) deep reactive ion etching: cyclic processes of passivating the silicon in plasma and isotropic etching in plasma.

Image of FIG. 2.
FIG. 2.

SEM images (tilted side view at ): (a) nanoporous membrane; (b) etch mask consisting of gold disks at the sites of the former membrane pores; (c) etched silicon nanopillars with gold dots on top; (d) nanoporous membrane after vapor deposition of gold: gold grid on top (upper part) and membrane pores partially filled with gold (lower part); (e) magnified image of filled membrane pores; (f) large area of etched silicon pillars exhibiting domains with good hexagonal order and “grain boundaries” in between.

Image of FIG. 3.
FIG. 3.

Transmission spectrum of the gold grid: experiment (solid noisy line) and model calculation (dashed line), showing bandpass behavior with a cutoff wavelength of and a diffraction wavelength of . For comparison we show a calculated transmission curve (dotted line) using the actual dimensions of the grid as determined by SEM.


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Scitation: Regular silicon pillars and dichroic filters produced via particle-imprinted membranes