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Scanning tunneling microscope based fabrication of nano- and atomic scale dopant devices in silicon: The crucial step of hydrogen removal
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10.1063/1.2433138
/content/aip/journal/jap/101/3/10.1063/1.2433138
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/3/10.1063/1.2433138
/content/aip/journal/jap/101/3/10.1063/1.2433138
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/content/aip/journal/jap/101/3/10.1063/1.2433138
2007-02-07
2014-12-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Scanning tunneling microscope based fabrication of nano- and atomic scale dopant devices in silicon: The crucial step of hydrogen removal
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/3/10.1063/1.2433138
10.1063/1.2433138
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