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Nickel silicide formation using multiple-pulsed laser annealing
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10.1063/1.2433707
/content/aip/journal/jap/101/3/10.1063/1.2433707
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/3/10.1063/1.2433707
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XRD spectra of sample after five-pulsed laser annealing for both as-deposited and annealed samples.

Image of FIG. 2.
FIG. 2.

XTEM bright field micrograph of sample after five-pulsed laser annealing at with the inset showing the SAED pattern of the crystalline layer.

Image of FIG. 3.
FIG. 3.

XRD spectra of sample after 20-pulsed laser annealing for both as-deposited and annealed samples.

Image of FIG. 4.
FIG. 4.

Bright field XTEM micrographs of sample after 20-pulsed laser annealing at (a) and (b) . The insets show the SAED pattern obtained from various conditions shown in (a) and (b).

Image of FIG. 5.
FIG. 5.

Sheet resistance value of the sample after 20-pulsed laser annealing at different laser fluences . The sheet resistances of the samples are normalized to that of the as-deposited (as-dep) sample.

Image of FIG. 6.
FIG. 6.

The diffuse surface reflectance (obtained from UV-visible measurement at laser wavelength) of the sample after laser annealing at different laser pulses. The reflectance values were taken for the as-deposited sample and after 1-pulsed, 5-pulsed, and 20-pulsed laser annealings which were labeled as 0, 1, 5, and 20 in the axis.

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/content/aip/journal/jap/101/3/10.1063/1.2433707
2007-02-08
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nickel silicide formation using multiple-pulsed laser annealing
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/3/10.1063/1.2433707
10.1063/1.2433707
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