(Color online) Atomic force microscopy topography images of thick gold films deposited on the silicon cantilevers at (a) , (b) , and (c) . An intermediate thick chromium layer was deposited at to enhance the adhesion between the gold layer and the cantilever.
(Color online) Atomic force microscopy topography images of gold films deposited on the cantilevers at for different thicknesses: (a) , (b) , (c) , (d) , and (e) . An intermediate thick chromium layer was deposited at to enhance the adhesion between the gold layer and the cantilever.
Profiles of silicon cantilevers from the same array without gold coating (-●-) and coated with a thick gold layer deposited at different rates: (-▵-), (◻∕), and (line). A schematic depiction of the cantilever is also shown to relate the sign of the cantilever bending to the orientation of the bimetallic cantilever. The profiles were obtained in water.
Profile of silicon cantilevers from the same array coated with different thicknesses of gold at a constant deposition rate of . (a) Profiles of the cantilevers before (10 and ) and after the coalescence process of the gold layer (60, 70, and ). (b) Profiles of the cantilevers for which the gold film is at the coalescence stage (30, 40, and ). The profiles were measured in water.
Relative change of the deflection profile due to the MCH adsorption for arrays of five cantilevers coated with of gold at deposition rates of (a) , (b) , and (c) . The measurements were performed in water.
(a) Cantilever free end deflection as a function of gold film thickness. (b) Relative displacement of the cantilever free end induced by the adsorption of MCH in water vs the gold layer thickness. The gold deposition rate was . The continuous line in (b) represents the theoretical decrease in the cantilever response only due to the cantilever stiffening caused by the gold coating. Positive values correspond to tensile stress, whereas the negative values correspond to compressive stress.
Experimental values of the grain size, roughness (root mean square) of the gold surface, surface stress induced by the gold film on the silicon cantilever, and surface stress induced by the MCH adsorption on the gold-coated cantilever as a function of the thickness and deposition rate of the gold film. The surface roughness was determined by calculating the root mean square (rms) of the AFM images for areas of .
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