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Crystallization of amorphous silicon by self-propagation of nanoengineered thermites
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10.1063/1.2450672
/content/aip/journal/jap/101/5/10.1063/1.2450672
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/5/10.1063/1.2450672

Figures

Image of FIG. 1.
FIG. 1.

SEM cross section image (scale: ) of CuO nanorod/Al nanoparticle slurry coating on Si substrate showing microvoid formation.

Image of FIG. 2.
FIG. 2.

Raman mapping of the samples prepared by the self-propagation of nanoengineered thermites.

Image of FIG. 3.
FIG. 3.

Electron dispersive spectroscopy of the samples in a region where maximum crystallization was achieved.

Image of FIG. 4.
FIG. 4.

Raman mapping of the samples prepared by the self-propagation of multilayer films.

Image of FIG. 5.
FIG. 5.

EDS mapping of the samples prepared by the self-propagation of multilayer films confirms that the poly-Si formed as a whole layer.

Image of FIG. 6.
FIG. 6.

AFM image of the samples prepared by the self-propagation of multilayer films confirms uniform crystallization with grain sizes around .

Tables

Generic image for table
Table I.

Fitted data for the samples prepared by the self-propagation of .

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/content/aip/journal/jap/101/5/10.1063/1.2450672
2007-03-07
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Crystallization of amorphous silicon by self-propagation of nanoengineered thermites
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/5/10.1063/1.2450672
10.1063/1.2450672
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