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Impact of the etching gas on vertically oriented single wall and few walled carbon nanotubes by plasma enhanced chemical vapor deposition
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10.1063/1.2654647
/content/aip/journal/jap/101/5/10.1063/1.2654647
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/5/10.1063/1.2654647
/content/aip/journal/jap/101/5/10.1063/1.2654647
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/content/aip/journal/jap/101/5/10.1063/1.2654647
2007-03-14
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Impact of the etching gas on vertically oriented single wall and few walled carbon nanotubes by plasma enhanced chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/5/10.1063/1.2654647
10.1063/1.2654647
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