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Effect of Mo interlayer on thermal stability of polycrystalline NiSi thin films
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10.1063/1.2714490
/content/aip/journal/jap/101/6/10.1063/1.2714490
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/6/10.1063/1.2714490
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

In situ measurements regarding (a) system and (b) system at different final annealing temperatures.

Image of FIG. 2.
FIG. 2.

Ex situ measurements of the annealed samples. The presence of the Mo interlayer results in a more stable system with a lower sheet resistance increase.

Image of FIG. 3.
FIG. 3.

Ex situ plan-view TEM analysis of a NiSi layer after (a) , (b) , and (c) annealing temperatures. The latter sample shows a large grain.

Image of FIG. 4.
FIG. 4.

In situ plan-view TEM analysis of (a) NiSi after at , (b) NiSi after at , (c) NiSi after at , (d) NiSi(Mo) after at , (e) NiSi(Mo) after at , and (f) NiSi(Mo) after at .

Image of FIG. 5.
FIG. 5.

(a) Hole density and (b) dimension of sample plotted against the annealing time for 500, 540, and annealing temperatures.

Image of FIG. 6.
FIG. 6.

(a) Hole density and (b) dimension of samples plotted against the annealing time for different temperatures.

Image of FIG. 7.
FIG. 7.

Hole density saturation values as a function of the temperature for (dashed curve) and (continuous curve) samples.

Image of FIG. 8.
FIG. 8.

Trends of hole growth rate in both the (a) and (b) systems.

Image of FIG. 9.
FIG. 9.

as a function of time for (a) and (b) samples.

Image of FIG. 10.
FIG. 10.

The saturation values vs the activation energy of hole nucleation for (dashed line) and (continuous line) samples are plotted.

Image of FIG. 11.
FIG. 11.

curves obtained with [(a) and (c)] the modified model and [(b) and (d)] pure Srolovitz for and samples, respectively.

Image of FIG. 12.
FIG. 12.

Ratio trends relative to (a) and (b) . In the inset in (b) the trend relative to process temperature is shown.

Image of FIG. 13.
FIG. 13.

Plan-view TEM micrographs of a (a) and (b) samples annealed at . Transrotational structures are marked in the inset and represented by a cross (bending borders).

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/content/aip/journal/jap/101/6/10.1063/1.2714490
2007-03-30
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of Mo interlayer on thermal stability of polycrystalline NiSi thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/101/6/10.1063/1.2714490
10.1063/1.2714490
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