Volume 101, Issue 7, 01 April 2007
Index of content:
Comment on “Low Schottky barrier to etched using regrown AlInGaN and InGaN contact layer” [J. Appl. Phys. 99, 026106 (2006)]101(2007); http://dx.doi.org/10.1063/1.2717136View Description Hide Description
In the Hsueh et al. article [J. Appl. Phys.99, 026106 (2006)], the authors discussed changes in Schottky barrier heights of contacts to the regrown contact layer on etched and adopted the thermionic emissionmodel to analyze their current-voltage data. In this comment we point to the principal theoretical flaw in the analysis of this work.
Controlling line-edge roughness and reactive ion etch lag in sub-150 nm features in borophosphosilicate glass101(2007); http://dx.doi.org/10.1063/1.2717141View Description Hide Description
We have developed a reactive ion etch (RIE) process in borophosphosilicate glass (BPSG) for 150 nm line-and-space features, where line-edge roughness (LER) complemented with RIE lag becomes a major issue. Effect of flow rates and carbon-to-fluorine atomic ratio of fluorohydrocarbon gases was utilized to achieve acceptable process window allowing lower radio frequency powers therefore obtaining acceptable LER and RIE lag in the high-resolution features etched into BPSG.
Adsorption-desorption noise influence on mass sensitivity and dynamic range of nanoresonators with rough surfaces101(2007); http://dx.doi.org/10.1063/1.2714792View Description Hide Description
In this work we investigate the influence of adsorption-desorption noise on nanoresonators with random rough surfaces. Indeed, surface roughening leads to an increased number of adsorption sites and thus to an increased limit to mass sensitivity and decreased dynamic range leading to increased nonlinear behavior. Extensive analysis of the surface morphology is necessary because it is not only the roughness amplitude that contributes to adsorption-desorption noise but also the lateral roughness correlation length , and the roughness exponent that characterizes short wavelength roughness . The latter is shown to have a comparable effect on adsorption-desorption noise as the roughness ratio .