(Color online) Dependence of in-plane coercivity on annealing temperature (a) and the corresponding hysteresis loops with annealing temperature of (b) for 12 nm FePt films without buffer (black) and with 2 nm Bi (blue), 6 nm Ta (red), and 6 nm Ta/2 nm Bi (black) buffer layers.
(Color online) X-ray diffraction patterns for 12 nm FePt films without buffer and with 2 nm Bi, 6 nm Ta, and 6 nm Ta/2 nm Bi buffer layers in the as-deposited state (red) and after annealing at in normal scans (black) and tilt scans (blue). The inset displays the normal full scan pattern of the Ta/Bi/FePt film annealed at .
XPS spectra of Fe , Pt , and Ta for the Ta/FePt film annealed at , with etching time indicated by the numbers at the right side of the spectra in minutes. Etching rate is about 2.2 nm/min.
Cross-section TEM micrographs for the Ta/Bi/FePt film after annealing at : (a) low magnification image; (b) high-resolution image; (c) high-resolution image with different object lens defocus. The inset of (a) is a selected area electron diffraction of the sample.
Composition profiles of elements for the Ta/Bi/FePt film annealed at probed by EDX line scan technique.
curves as a function of the in-plane field for FePt films with different buffer layers annealed at .
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