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Carrier mobility degradation due to high dose implantation in ultrathin unstrained and strained silicon-on-insulator films
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10.1063/1.2811922
/content/aip/journal/jap/102/10/10.1063/1.2811922
http://aip.metastore.ingenta.com/content/aip/journal/jap/102/10/10.1063/1.2811922
/content/aip/journal/jap/102/10/10.1063/1.2811922
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/content/aip/journal/jap/102/10/10.1063/1.2811922
2007-11-29
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Carrier mobility degradation due to high dose implantation in ultrathin unstrained and strained silicon-on-insulator films
http://aip.metastore.ingenta.com/content/aip/journal/jap/102/10/10.1063/1.2811922
10.1063/1.2811922
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