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A method for applying a large persistent in-plane biaxial stress to influence the perpendicular magnetic anisotropy of magnetic thin films
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10.1063/1.2821309
/content/aip/journal/jap/102/11/10.1063/1.2821309
http://aip.metastore.ingenta.com/content/aip/journal/jap/102/11/10.1063/1.2821309
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Wide-angle x-ray diffraction spectra of an as-prepared sample and samples after hydrogen loading of (a) thick Ni film on a thick Ta substrate and (b) thick on thick Ta substrate. The intensity is plotted on a logarithmic scale for better visibility of the Ni and peak shifts. The spectra after hydrogen loading have been multiplied by factors 5 and 25 with an increasing loading time.

Image of FIG. 2.
FIG. 2.

loops of Ni films on a Ta substrate with the magnetic field applied perpendicular to the plane of an as-prepared sample (open circles) as well as of samples with biaxial stresses of (open triangles) and (open squares); a hysteresis loop was also recorded with the magnetic field applied in the plane of the as-prepared sample (solid line). Inset shows loops for a Ni film deposited on a Si substrate.

Image of FIG. 3.
FIG. 3.

The effective perpendicular anisotropy energy as a function of in-plane biaxial tensile stress applied to a Ni thin film. The slope of the linear fit of Eq. (1) to the data points is proportional to the magnetostriction coefficient.

Image of FIG. 4.
FIG. 4.

loops of films on a Ta substrate with the magnetic field applied perpendicular to the plane of an as-prepared sample (open circles) as well as of the sample with biaxial stress of (open triangles); a hysteresis loop was also recorded with the magnetic field applied in the plane of the as-prepared sample (solid line).

Image of FIG. 5.
FIG. 5.

The effective perpendicular anisotropy energy of as a function of the applied in-plane biaxial tensile stress.

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/content/aip/journal/jap/102/11/10.1063/1.2821309
2007-12-10
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: A method for applying a large persistent in-plane biaxial stress to influence the perpendicular magnetic anisotropy of magnetic thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/102/11/10.1063/1.2821309
10.1063/1.2821309
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