XRD data of ZFO thin films deposited on (0001) substrate under substrate temperature and oxygen pressure.
Temperature dependences of magnetization measured under FC and ZFC at 100 Oe. The ZFO film was deposited under substrate temperature and oxygen pressure. The inset shows the curve measured at 300 K.
(a) Variation of resistivity measured at 300 K and (b) variation of saturated magnetization when varying the oxygen pressure and the substrate temperature.
Temperature dependences of resistivity for ZFO thin films. The inset shows the variation of thermal activation energies.
Comparison between thermodynamic equilibrium lines (the amount of ) and our experimental trend of resistivity variation.
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