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Interference lithography by a soft x-ray laser beam: Nanopatterning on photoresists
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View: Figures


Image of FIG. 1.
FIG. 1.

Schematic of the first Lloyd mirror interferometer.

Image of FIG. 2.
FIG. 2.

Schematic of the second Lloyd mirror interferometer.

Image of FIG. 3.
FIG. 3.

Dependence of the aerial fringe visibility on the half-pitch dimension calculated for the first (solid line) and the second (empty triangles) Lloyd mirror interferometers, assuming .

Image of FIG. 4.
FIG. 4.

Limitations on the maximum number of fringes vs the half pitch imposed by the temporal coherence length of (solid line) and by different values of the spatial coherence length: (dotted line), (dashed line), and (crossed line).

Image of FIG. 5.
FIG. 5.

Dependence of the vertical modulation of patterns with a half pitch of on the illumination dose.

Image of FIG. 6.
FIG. 6.

SEM images of patterns impressed with the first Lloyd mirror configuration having the half pitch of . The patterns were obtained with (a) (single laser shot) and (b) (20 laser shots).

Image of FIG. 7.
FIG. 7.

AFM images and corresponding plot profiles of half-pitch structures printed with the first (a) and the second (b) Lloyd mirror configurations, respectively.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Interference lithography by a soft x-ray laser beam: Nanopatterning on photoresists