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High quality epitaxial using plasma nitridation-mediated epitaxy: The effects of the capping layer
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10.1063/1.2805649
/content/aip/journal/jap/102/9/10.1063/1.2805649
http://aip.metastore.ingenta.com/content/aip/journal/jap/102/9/10.1063/1.2805649
/content/aip/journal/jap/102/9/10.1063/1.2805649
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/content/aip/journal/jap/102/9/10.1063/1.2805649
2007-11-08
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High quality epitaxial CoSi2 using plasma nitridation-mediated epitaxy: The effects of the capping layer
http://aip.metastore.ingenta.com/content/aip/journal/jap/102/9/10.1063/1.2805649
10.1063/1.2805649
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