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Process-induced positive charges in Hf-based gate stacks
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10.1063/1.2826937
/content/aip/journal/jap/103/1/10.1063/1.2826937
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/1/10.1063/1.2826937
/content/aip/journal/jap/103/1/10.1063/1.2826937
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/content/aip/journal/jap/103/1/10.1063/1.2826937
2008-01-11
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Process-induced positive charges in Hf-based gate stacks
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/1/10.1063/1.2826937
10.1063/1.2826937
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