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Shallow level trap formation in induced by high field and thermal stresses
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10.1063/1.2924428
/content/aip/journal/jap/103/10/10.1063/1.2924428
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/10/10.1063/1.2924428
/content/aip/journal/jap/103/10/10.1063/1.2924428
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/content/aip/journal/jap/103/10/10.1063/1.2924428
2008-05-20
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Shallow level trap formation in SiO2 induced by high field and thermal stresses
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/10/10.1063/1.2924428
10.1063/1.2924428
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