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Ellipsometric in situ measurement of oxidation kinetics and thickness of (C2–C20) alkylsilyl (sub)monolayers
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10.1063/1.2832439
/content/aip/journal/jap/103/2/10.1063/1.2832439
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/2/10.1063/1.2832439
/content/aip/journal/jap/103/2/10.1063/1.2832439
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/content/aip/journal/jap/103/2/10.1063/1.2832439
2008-01-28
2014-09-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ellipsometric in situ measurement of oxidation kinetics and thickness of (C2–C20) alkylsilyl (sub)monolayers
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/2/10.1063/1.2832439
10.1063/1.2832439
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