UPS valence band spectra of MEH-PPV (on Au) at different Al deposition times.
(a) XPS C spectra of MEH-PPV at different Al deposition steps. (b) Peak area and (c) percentage peak area for C–O, C–C, and C– signals.
(a) XPS Al spectra at different Al deposition steps on MEH-PPV. (b) Angle-resolved XPS analysis of Al on MEH-PPV (after 13 min of Al deposition).
(a) XPS elemental depth profile analysis and (b) Al spectrum at various sputtering intervals.
Survey spectrum of PS (a) and PS-O3 (b) at various Al deposition steps.
Decay of peak area of PS, PS-O3, and MEH-PPV during Al evaporation.
(a) Al spectra for PS and PS-O3 samples. (b) C spectrum for PS-O3 at different Al deposition steps.
SEM images of Al deposited MEH-PPV samples (a) at and (b) at magnification. Evaporation was carried out inside the XPS side chamber.
AFM scanning images of (a) pristine PS and (b) PS after 30 min Al evaporation. Each division in the - and -axes corresponds to . Each division in the -axis corresponds to 30 nm.
FIB images of the surface of Al deposited PS surface at different magnifications (a), (b), (c). Cross-sectional FIB analysis of Al deposited PS (d) and MEH-PPV (e) samples.
Schematic drawings representing possible morphology of the metal/semiconductor interface for a (a) reactive polymer and (b) considerably inert polymer surface.
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