(a) An STM image of Tm silicide nanostructures on Si(001). (b) A height profile along the line shown in (a).
(a) An STM image of an elongated Tm silicide island with a modulation in height. (b) Height profile along the line shown in (a).
A comparison of simulated lattice images and the corresponding crystal structures of hexagonal [(a) and (b)] and orthorhombic TmSi [(c) and (d)] along the indicated axes.
(a) Cross-sectional HRTEM image of a Tm silicide nanostructure on Si(001). (b) Enlarged atomic lattice shows rectangular symmetry. (c) Corresponding FFT from area (b).
(a) Cross-sectional HRTEM image of Tm silicide nanostructure capped with an amorphous layer. (b) Enlarged lattice image from the rectangle in (a) shows stacking similar to the simulated image of orthorhombic TmSi viewed along . (c) Corresponding FFT shows a TmSi  zone. (d) A comparison of an FFT filtered lattice image from the nanostructure and a simulated image of orthorhombic TmSi viewed along  (inset). (e) FFT filtered lattice image from Si substrate.
(a) Cross sectional HRTEM image of Tm silicide nanostructure on Si(001) shows a stacking symmetry with a half-atom shift between every two rows of atoms consistent with the orthorhombic TmSi  axis. (b) and (c) are the corresponding FFTs from areas (1) and (2).
Two types of lattice stacking observed in each of two nanostructures: (a) approximately wide and approximately thick; (b) approximately wide and approximately thick. Different stackings are marked by arrows and compared to simulated images.
Lattice parameters of the bulk Tm silicide phases and those measured from the imaged nanostructures.
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