1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Reduction of critical current density for domain wall motion in U-shaped magnetic patterns
Rent:
Rent this article for
USD
10.1063/1.2830544
/content/aip/journal/jap/103/7/10.1063/1.2830544
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/7/10.1063/1.2830544
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic images of U-shaped domain wall Deesaw (DW seesaw) operation, (b) DW seesaw memory cell, and (c) topological image of U-shaped pattern.

Image of FIG. 2.
FIG. 2.

Magnetization curves ( curves) for laminated films and NiFe–Cu alloy films: (a) easy axis, (b) hard axis magnetization for films, (c) easy axis, and (d) hard axis for NiFe–Cu films.

Image of FIG. 3.
FIG. 3.

Additives composition dependence of (a) magnetization and (b) anisotropy field in and NiFe–Cu alloy films.

Image of FIG. 4.
FIG. 4.

Passing current dependence of resistivity in U-shaped NiFe patterns.

Image of FIG. 5.
FIG. 5.

Additive composition dependence of critical current density required for domain wall motion for and NiFe–Cu alloy films.

Image of FIG. 6.
FIG. 6.

dependence of in and NiFe–Cu films.

Loading

Article metrics loading...

/content/aip/journal/jap/103/7/10.1063/1.2830544
2008-02-04
2014-04-20
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduction of critical current density for domain wall motion in U-shaped magnetic patterns
http://aip.metastore.ingenta.com/content/aip/journal/jap/103/7/10.1063/1.2830544
10.1063/1.2830544
SEARCH_EXPAND_ITEM