Coordinate system used in the reflectance analysis.
(a) A schematic diagram of the investigated structure with 5.5 pair Bragg mirror above and 6 pair Bragg mirror below the defect layer, (b) the SEM image of the fabricated structure, and (c) the measured reflectance from spectrophotometer with 6° angle of incidence using unpolarized light.
The measured reflectance at 6° angle of incidence compared to the optimized theoretical reflectance.
The measured reflectance at 6° angle of incidence compared to the theoretical reflectance. In (a) the resolution of the spectrophotometer is taken into account by convolving the theoretical curve with FWHM Gaussian whereas in (b) both resolution of the spectrophotometer and the variations in the layer thicknesses at the incident light spot are included.
The reflectance measured by ellipsometry using (a) -polarized and (b) -polarized light as a function of the wavelength with three different angles of incidence. The corresponding theoretical curves are shown in (c) and (d), respectively.
Targeted, experimentally observed and numerically optimized values for the thicknesses and porosities.
A comparison of the resonance wavelengths and the splitting of the resonance wavelengths between two different polarizations for experimental and theoretical (anisotropic and isotropic) curves.
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