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Detection of Si nanoclusters by x-ray scattering during silicon film deposition by mesoplasma chemical vapor deposition
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10.1063/1.2956692
/content/aip/journal/jap/104/1/10.1063/1.2956692
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/1/10.1063/1.2956692
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the SAXS setup. The x-ray tube and the position-sensitive proportional counter (PSPC) are placed in a horizontal scattering lane. The x-ray beam passes parallel to the substrate surface and the scattered x-ray due to the silicon nanoclusters generated within the plasma-substrate boundary layer is monitored by the PSPC detector after a Ni filter.

Image of FIG. 2.
FIG. 2.

Simulations of the scattering profiles for ideal monodisperse systems of spherical scattering objects having sizes of 1, 5, and . The profiles are plotted within a scattering vector range which is comparable with the experimental data.

Image of FIG. 3.
FIG. 3.

Comparison of the scattering profiles before (solid square) and after (open circle) background subtraction. The raw scattering curve corresponds to the as-collected data from an plasma for at . The corrected curve was obtained after subtracting the data collected for an plasma only at the same rf power.

Image of FIG. 4.
FIG. 4.

X-ray scattering profiles and nanocluster size distributions. (a) Intensity vs plots measured at partial pressures of 1, 5, and for rf powers of (denoted by open symbols) and (denoted by closed symbols). The curves are vertically offset for clarity. (b) The calculated size distributions for the curves obtained at . (c) The size distributions for .

Image of FIG. 5.
FIG. 5.

Shape information from Kratky plots. (a) Kratky [ vs ] plots at partial pressures of 1, 5, and for rf powers of (open symbols) and (closed symbols). The curves are vertically offset for clarity. The more pronounced emergence of the secondary and tertiary peaks (around 0.6 and , respectively) at compared to suggests a slight difference in size distributions. (b) Analysis of the Kratky plots by peak separation. The separation of the peaks is illustrated at the inset for the case of at . The variation of the FWHM of the primary peak (solid symbols) and the ratio of the integrated area of the primary-to-secondary peak (open symbols) is compared at different partial pressures for rf powers of (red) and (blue).

Image of FIG. 6.
FIG. 6.

Surface structure information from Porod plots. Porod representations [ vs ] at partial pressures of 1, 5, and for rf powers of (open symbols) and (closed symbols). The curves are vertically offset for clarity. A change in the general behavior is observed at the scattering vector range of .

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/content/aip/journal/jap/104/1/10.1063/1.2956692
2008-07-15
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Detection of Si nanoclusters by x-ray scattering during silicon film deposition by mesoplasma chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/1/10.1063/1.2956692
10.1063/1.2956692
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