1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Alternative to classic annealing treatments for fractally patterned thin films
Rent:
Rent this article for
USD
10.1063/1.3021161
/content/aip/journal/jap/104/10/10.1063/1.3021161
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/10/10.1063/1.3021161

Figures

Image of FIG. 1.
FIG. 1.

Evolution of the (101) anatase diffraction peak as a function of the laser fluence.

Image of FIG. 2.
FIG. 2.

Raman spectra of irradiated for various fluences

Image of FIG. 3.
FIG. 3.

Evolution of FWHM function of fluence.

Image of FIG. 4.
FIG. 4.

Top view SEM micrographs of the as deposited film and irradiated film with , (a) and (b), respectively.

Image of FIG. 5.
FIG. 5.

three-dimensional AFM images of irradiated thin film for fluence (a) , (b) , (c) , (d) , (e) , and (f) . (g) as deposited .

Image of FIG. 6.
FIG. 6.

Evolution of the rms roughness of the film as a function of the laser fluence

Image of FIG. 7.
FIG. 7.

Schematic 2D description of two different topographies with the same surface area.

Image of FIG. 8.
FIG. 8.

Ratio between the geometrically projected area and the area of the topography determined by AFM measurement.

Image of FIG. 9.
FIG. 9.

Evolution of the contact angle in the partial melting regime and in the melting-solidification regime.

Image of FIG. 10.
FIG. 10.

Numerical simulation of the maximum induced surface temperature by means of FLUENT computational fluid dynamics software.

Image of FIG. 11.
FIG. 11.

Temperature, time, and transition diagram.

Image of FIG. 12.
FIG. 12.

Roughness factor comparison between classic and fractal methods.

Tables

Generic image for table
Table I.

general properties used in temperature calculation.

Generic image for table
Table II.

thermal parameters used in temperature calculation.

Loading

Article metrics loading...

/content/aip/journal/jap/104/10/10.1063/1.3021161
2008-11-18
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Alternative to classic annealing treatments for fractally patterned TiO2 thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/10/10.1063/1.3021161
10.1063/1.3021161
SEARCH_EXPAND_ITEM