High resolution XPS spectra in the binding energy region of (a) and (b) .
(a) Section through a spherical indentation, with a tip radius , showing the maximum applied force , the penetration depth reached at this applied force , and the contact depth . (b) Schematic representation of a nanoindentation curve showing the quantities described in the nanoindentation section seen in (a). It can be noted how the contact depth is calculated from the nanoindentation curve.
(a) The force vs penetration depth curve for a (100) InP surface in the elastic regime at the instrument resolution, which follows the Hertz model with and (b) the corresponding AFM image of residual surface impression following the nanoindentation curve in (a). (c) The nanoindentation curve in the plastic regime for the same InP surface and (d) the corresponding AFM image of the residual surface impression. Closed circles (●) represent load portion and open circles (○) show the unload portion.
AFM images following elastic nanoindentation under different forces and their topographical profiles: (a) 100, (b) 110, (c) 120, and (c) . All images and all profiles are under the same respective scale, shown at the bottom of the figure.
Measurements of the maximum MCP vs contact depth for InP using the partial load/unload method. The circles are the force values divided by the projected contact area.
Close look in the MCP vs contact depth curve. Open circles (○) represent the values calculated from the nanoindentation curves and closed circles (●) are the MCP including a correction of 3 nm in the contact depth.
AFM images of the residual impressions of a nanoindentation with of maximum force, in the elastic regime for InP at the instrument resolution. (a) The pit just after the indentation. (b) The same pit after a chemical etching to remove the InP native oxide layer. Both images have the same range, from 0 to 2 nm.
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