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Scanning near-field optical microscopy study of metallic square hole array nanostructures
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10.1063/1.3032902
/content/aip/journal/jap/104/11/10.1063/1.3032902
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/11/10.1063/1.3032902

Figures

Image of FIG. 1.
FIG. 1.

(a) SEM picture of the simple-square array metallic nanostructure built on 120 nm thick gold film (sample 1). The size of each square air hole is and the unit cell size is . (b) SEM picture of the composite-square array metallic nanostructure (sample 2). (c) Schematic map of sample 2. The unit cell size is also . The central large square air hole has a size of and the eight peripheral smaller square air holes each has a size of . The center-to-center distance between two adjacent smaller square air holes is . (d) Schematic working principle of SNOM operating in the collection mode. Light emerging from a single-mode fiber illuminates the glass substrate and penetrates through the periodic array of metallic nanostructures. The cantilever probe collects the transmission optical near-field signals at the surface of metallic nanostructures.

Image of FIG. 2.
FIG. 2.

(a) Measured topography and near-field intensity distribution of sample 1 at different wavelengths of 1510, 1530, 1550, 1570, 1590, 1610, 1630, and 1640 nm. The scanning area is and each contains periods. Wavelength is marked at top left corner in each image. The vertical lines and letters in each image denote the cross-sectional profile curves in Fig. 3.

Image of FIG. 3.
FIG. 3.

Near-field intensity profile curves scanned along the line in Figs. 2(b)–2(i) for sample 1 at different wavelengths from 1510 to 1640 nm. In all the wavelengths, two main light spots exist and are about in distance.

Image of FIG. 4.
FIG. 4.

(a) Measured topography of sample 2. [(b)–(i)] The measured optical near-field intensity distribution images at wavelengths of 1510, 1530, 1550, 1570, 1590, 1610, 1630, and 1640 nm. Wavelength is marked at the top left corner and one period is marked by a dashed square in each image. In panels (b) and (c) the letters denote the cross-sectional profile curves in Fig. 5.

Image of FIG. 5.
FIG. 5.

Near-field intensity profile curves according to Fig. 4 at wavelength of 1510 nm [(a1) and (a2)] and at wavelength of 1530 nm [(b1) and (b2)]. Three main light spots exist in panels (a1) and (a2) and two main light spots exist in panels (b1) and (b2), respectively.

Image of FIG. 6.
FIG. 6.

Calculated optical near-field intensity distribution of transmission waves for sample 1 made on Au films at different wavelengths ranging from 1510 to 1640 nm. The incident electric field is polarized along the -axis and only data in a single unit cell are shown. The square air hole is depicted in each image by red dashed lines. In all the wavelengths, two major light spots about in distance are found to locate at the edges of the square air hole.

Image of FIG. 7.
FIG. 7.

Calculated optical near-field intensity distribution of transmission waves for sample 2 made on Au films at different wavelengths ranging from 1510 to 1640 nm. The incident electric field is polarized along the -axis and only data in a single unit cell are shown. The large and small air holes are depicted in each image by red dashed lines. The electromagnetic energy is concentrated at the peripheral smaller square air holes rather than at the central larger square air hole.

Image of FIG. 8.
FIG. 8.

Calculated optical near-field intensity distribution of transmission waves for sample 3 made on silicon film at different wavelengths ranging from 1510 to 1640 nm. The incident electric field is polarized along the -axis and only data in a single unit cell are shown. The square air hole is depicted in each image by red dashed lines.

Image of FIG. 9.
FIG. 9.

Calculated optical near-field intensity distribution of transmission waves for sample 4 made on silicon film at different wavelengths ranging from 1510 to 1640 nm. The incident electric field is polarized along the -axis and only data in a single unit cell are shown. The large and small square air holes are depicted in each image by red dashed lines.

Tables

Generic image for table
Table I.

Summary of numbers and locations of light spots in the optical near-field patterns for sample 2. The data are extracted via analysis in Fig. 4.

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/content/aip/journal/jap/104/11/10.1063/1.3032902
2008-12-02
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Scanning near-field optical microscopy study of metallic square hole array nanostructures
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/11/10.1063/1.3032902
10.1063/1.3032902
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