(a) Absorption spectrum of the photoresist mixture. (b) Schematic of laser exposure induced phase separation in a mixture of LC and photoresist. (c) SEM of fabricated structure in a mixture where the LC was inhomogeneously mixed with photoresist.
(a) SEM of fabricated multiple-layer phase mask and (b) schematic of laser beam diffraction through the phase mask.
3D pattern of the five-beam interference with (a) , (b) , (c) , (d) , (e) , and (f) .
(a) SEM of photonic crystal template fabricated using the multiple-layer phase mask through single beam and single exposure method and (b) the enlarged view of the template. The insets are the simulations of five-beam interference pattern.
(a) Schematic of beam overlapping showing five-beam interference region, three-beam interference region, and formed interference patterns in these regions. (b) SEM of fabricated photonic crystal template: the top-left region is formed through five beams while the bottom-right region is formed through three beams.
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