(a) Chemical etching of Si wafer in solution for synthesizing : phosphor. (b) Optical microscopy view of the chemically synthesized : phosphor on Si(100) wafer.
(a) XRD pattern for chemically synthesized phosphor :. (b) XRD pattern from an ASTM card of (space ). (c) Three-dimensional perspective view of the crystallite (hieratite).
XPS survey spectra for (a) chemically synthesized phosphor : on Si(100) wafer and (b) as-degreased Si(100) wafer.
Room-temperature PL spectrum for chemically synthesized phosphor : in solution for 10 min, together with that obtained from a PSi layer. The PSi layer was formed by etching wafer in a solution for 10 min.
PL spectra measured at , 200, and 300 K for chemically synthesized phosphor : on Si(100) wafer.
Schematic energy level diagram for :. The reservoir levels were determined from the Arrhenius plots of the PL intensity.
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