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Optical emission spectroscopy of atmospheric pressure microwave plasmas
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10.1063/1.2975345
/content/aip/journal/jap/104/5/10.1063/1.2975345
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/5/10.1063/1.2975345
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the atmospheric pressure microwave plasma source used in this study. A representative photograph of the He plasma in air environment (He: 1000 SCCM; microwave power: 50 W) is also shown.

Image of FIG. 2.
FIG. 2.

(a) Typical emission spectrum of the Ar plasma in air environment (Ar: 400 SCCM; microwave power: 45 W). To obtain useful information on the plasma chemistry, emission lines in a range between 400 and 700 nm are emphasized and focused through this study. (b) Emission spectra of the Ar plasmas in air environment versus the input microwave power at a constant gas flow rate of 500 SCCM.

Image of FIG. 3.
FIG. 3.

Dependences of the (a) emission intensities and the (b) intensity ratios of specific emission lines from the Ar plasmas in air environment on the input microwave power at a constant Ar gas flow rate of 500 SCCM.

Image of FIG. 4.
FIG. 4.

Dependences of the (a) emission intensities and the (b) intensity ratios of specific emission lines from the Ar plasmas in air environment as a function of the Ar gas flow rate under a fixed input power of 45 W.

Image of FIG. 5.
FIG. 5.

Emission spectra of the He plasmas in air environment vs source gas flow rate.

Image of FIG. 6.
FIG. 6.

Variations of the (a) emission intensities and the (b) intensity ratios of specific emission lines from the He plasmas in air environment as a function of the He gas flow rate under a constant microwave power of 40 W.

Image of FIG. 7.
FIG. 7.

Emission spectra of the plasmas generated in air environment using pure Ar (500 SCCM), pure He (400 SCCM), and mixture (Ar: 100 SCCM; He: 400 SCCM), respectively.

Image of FIG. 8.
FIG. 8.

Dependences of the emission intensities of specific emission lines from the mixture plasmas as functions of the (a) input microwave power (Ar: 100 SCCM; He:400 SCCM) and (b) He gas flow rate (Ar: 100 SCCM; microwave power: 40 W).

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/content/aip/journal/jap/104/5/10.1063/1.2975345
2008-09-08
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Optical emission spectroscopy of atmospheric pressure microwave plasmas
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/5/10.1063/1.2975345
10.1063/1.2975345
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