XRD diffractograms of a 60 unit cell thick film of at low-angle (a), and around the (001) (b) and (002) (c) Bragg reflections, respectively. (d) and (e) show phi scans of the (101) reflections for and , respectively.
Reciprocal space map of the (103) Bragg reflection for a 80 nm thick film of .
AFM images of a 14 unit cell (a) and a 105 unit cell (b) thick film of . (c) shows a plane-view TEM image of a 27 unit cell thick film of .
A typical ferroelectric hysteresis loop (a) and displacement current vs electric field (b) for a 100 nm thick film of .
High-resolution linear profiles recorded for the (001), (003), (103), and (303) reflections of a 58 unit cell thick film of .
(a) 2D FFT of an AFM image equivalent to that displayed in the inset of Fig. 3(a). (b) profile of this 2D FFT, fitted by Voigt functions. (c) Film thickness dependence of the in-plane surface modulation. (d) Film thickness dependence of the XRD intensities of corresponding Bragg and satellite peaks.
(a) Schematic illustration of the ferroelectric stripe domains. (b) Simulated profile intensities for domain size ratios from 10% up to 90% up.
The dependence of the diffuse scattering peaks on for a 27 unit cell thick film of , recorded around the (001) reflection.
(a) In-plane x-ray scattering profiles for 16, 42, 72, and 94 unit cell thick films of . (b) Film thickness dependence of the mean stripe width for grown on and substrates, respectively.
Depolarization field dependence of the stripe width for the ferroelectric stripe domain ground state.
High-resolution linear profiles of (a) and (b), recorded immediately after growth and again after 1 year of storage in air.
(a) Map of simulated profiles vs random variations in stripe width for an idéal 50:50 vs stripe domain state. (b) Corresponding line profiles for 0%, 25%, 50%, 75%, and 100% random variation in stripe width.
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