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Modeling of the evolution of dielectric loss with processing temperature in ferroelectric and dielectric thin oxide films
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10.1063/1.2999638
/content/aip/journal/jap/104/7/10.1063/1.2999638
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/7/10.1063/1.2999638
/content/aip/journal/jap/104/7/10.1063/1.2999638
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/content/aip/journal/jap/104/7/10.1063/1.2999638
2008-10-15
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modeling of the evolution of dielectric loss with processing temperature in ferroelectric and dielectric thin oxide films
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/7/10.1063/1.2999638
10.1063/1.2999638
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