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Modeling of the evolution of dielectric loss with processing temperature in ferroelectric and dielectric thin oxide films
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10.1063/1.2999638
/content/aip/journal/jap/104/7/10.1063/1.2999638
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/7/10.1063/1.2999638

Figures

Image of FIG. 1.
FIG. 1.

Schematic representation of the spherical inclusion model. The dark color corresponds to inclusions of the crystallites.

Image of FIG. 2.
FIG. 2.

Schematic illustration of the correlation between grain boundary density and crystallization process: (a) amorphous matrix , (b) start-up of crystallization with nucleation , (c) progress in crystallization with an increase in the number of crystalline grains and grain size , and (d) coalescent growth of small grains into big ones .

Image of FIG. 3.
FIG. 3.

Evolution of dielectric loss with processing temperature for the BST and PMNT thin films, measured at 300 K and 100 kHz.

Image of FIG. 4.
FIG. 4.

XRD scans of the BST thin films with a thickness of 500 nm that were deposited on substrates and postannealed at different temperatures.

Image of FIG. 5.
FIG. 5.

AFM micrographs for the 500-nm-thick BST films annealed at different temperatures: (a) 435, (b) 465, (c) 535, (d) 585, (e) 635, and (f) . It is pointed out that the scan area is for all the images.

Image of FIG. 6.
FIG. 6.

Modeling of dielectric losses as a function of the processing temperature for BST thin films 500 nm in thickness, as well as its comparison with the experimental results. Note that the error bars arise from the difficulty in precise estimation of crystalline volume ratio and grain boundary density .

Tables

Generic image for table
Table I.

Processing temperature dependent crystalline volume ratio and grain boundary density for the 500-nm-thick BST films.

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/content/aip/journal/jap/104/7/10.1063/1.2999638
2008-10-15
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modeling of the evolution of dielectric loss with processing temperature in ferroelectric and dielectric thin oxide films
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/7/10.1063/1.2999638
10.1063/1.2999638
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