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Strain optimization in ultrathin body transistors with silicon-germanium source and drain stressors
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10.1063/1.3000481
/content/aip/journal/jap/104/8/10.1063/1.3000481
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/8/10.1063/1.3000481
/content/aip/journal/jap/104/8/10.1063/1.3000481
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/content/aip/journal/jap/104/8/10.1063/1.3000481
2008-10-24
2014-11-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Strain optimization in ultrathin body transistors with silicon-germanium source and drain stressors
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/8/10.1063/1.3000481
10.1063/1.3000481
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