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Transport and magnetic properties of epitaxial films
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10.1063/1.3008010
/content/aip/journal/jap/104/9/10.1063/1.3008010
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/9/10.1063/1.3008010

Figures

Image of FIG. 1.
FIG. 1.

Typical RHEED pattern recorded during the growth of the sample 20 on GaAs (100)—left viewgraph—and typical XRD scan for a 200 nm film—right graph.

Image of FIG. 2.
FIG. 2.

Temperature dependence of the resistivity in the films (samples 14, 35 and 20).

Image of FIG. 3.
FIG. 3.

Different plots of sample 20: (a) vs and (b) vs . The straight lines are the linear fits of the data between 5 and 45 K.

Image of FIG. 4.
FIG. 4.

The dependence vs for the films (samples 14, 35, and 20).

Image of FIG. 5.
FIG. 5.

Low- and high-field MR in the longitudinal and transversal configuration at 295 and 4.2 K measured on film sample 20.

Image of FIG. 6.
FIG. 6.

Low- and high-field MR in the longitudinal configuration at different temperatures measured on the film sample 20.

Image of FIG. 7.
FIG. 7.

Low-field MR at 50 mT and the high-field MR at 8 T in the longitudinal configuration in the temperature range between 4.2 and 295 K measured on the films (samples 14, 35, and 20).

Image of FIG. 8.
FIG. 8.

Low-field MR at 295 K in the longitudinal and transverse configuration on the film sample 14.

Image of FIG. 9.
FIG. 9.

Angle dependence of the low-field MR at 200 K on the film sample 20. (a) MR in the longitudinal and transverse configuration. (b) MR in dependence of the angle between current and field direction at constant field of 50 mT.

Image of FIG. 10.
FIG. 10.

Magnetic hysteresis loops at 295 K for the film sample 20.

Tables

Generic image for table
Table I.

Preparation and film parameter of epitaxial samples prepared for the transport studies.

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/content/aip/journal/jap/104/9/10.1063/1.3008010
2008-11-06
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Transport and magnetic properties of Fe3Si epitaxial films
http://aip.metastore.ingenta.com/content/aip/journal/jap/104/9/10.1063/1.3008010
10.1063/1.3008010
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