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ion implantation for strain relaxation of pseudomorphic heterostructures
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10.1063/1.3139274
/content/aip/journal/jap/105/11/10.1063/1.3139274
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/11/10.1063/1.3139274
/content/aip/journal/jap/105/11/10.1063/1.3139274
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/content/aip/journal/jap/105/11/10.1063/1.3139274
2009-06-03
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Si+ ion implantation for strain relaxation of pseudomorphic Si1−xGex/Si(100) heterostructures
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/11/10.1063/1.3139274
10.1063/1.3139274
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