Typical XRD patterns of TNO films grown on LAO at for with (a) and (b) . is defined as the angle between the film surface and the diffractometer plane.
Room temperature (a) resistibility , (b) carrier density , and (c) Hall mobility of TNO films grown on (100) (closed marks) and seed-layer covered glass (open marks) as functions of . The films were grown at . Dashed lines are typical values of PLD-grown epitaxial films on LAO (, and ).
XRD patterns of TNO polycrystalline films grown on at (a) and , (b) and , and (c) and . and denote the diffraction peak from the plane of the anatase and rutile phase, respectively. The peak labeled Si(400) is from the substrate.
Growth parameter-based [ and ] phase diagram of film on (a) LAO(100) and (b) substrates. Circle, cross, and triangle symbols denote pure anatase phase, pure rutile phase, and mixture of anatase and rutile phases, respectively. The films were grown under a total pressure of .
XRD patterns of TNO polycrystalline films grown on seed-layer/ substrates under (a) and , (b) and . Line (c) represents the XRD pattern of a TNO film grown directly on bare [same as the line(c) in Fig. 3] for comparison. The seed-layer is an anatase TNO layer grown at and . The bottom panel schematically illustrates the structure of the TNO film from which the diffraction pattern (a) was measured.
Surface morphology of TNO polycrystalline films grown by the seed-layer method (top panel) and the thermal annealing method (bottom panel) observed by POM (left) and AFM (right). The film shown in the bottom panel was fabricated under the same conditions described in Ref. 13.
Cross sectional TEM images of TNO polycrystalline films grown by the seed-layer method (top panel) and the thermal annealing method (bottom panel). (b) and (d) are closeup images of (a) and (c), respectively. The film shown in the bottom panel was fabricated under the same conditions described in Ref. 13.
Optical (a) transmittance , (b) reflectance , and (c) absorption spectra of TNO polycrystalline films grown on bare glass and seed-layer/glass in the wavelength range . The films were deposited at and .
Article metrics loading...
Full text loading...