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Failure mechanism analysis of electromigration dominated damage in nanowires
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10.1063/1.3151965
/content/aip/journal/jap/105/12/10.1063/1.3151965
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/12/10.1063/1.3151965
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Morphology image of an individual nanowire and EF-TEM elemental distribution images corresponding to O–K, Si–K, and Ti-L23, presenting the element distribution profile of the nanocable.

Image of FIG. 2.
FIG. 2.

A characteristic current-voltage measurement curve. The inset is the resistance variation of each measurement point, which is the ratio between the value of resistance on each measurement point and the initial resistance value.

Image of FIG. 3.
FIG. 3.

SEM image and EDS element mapping results. The diffusion of Pt into the nanowire from the electrode is verified.

Image of FIG. 4.
FIG. 4.

The migration of Ti. (a) The SEM image. (b) The EDS element mapping result of Ti. (c) The SEM image with an arrow showing the route of the EDS line scan. (d) The EDS line scan results, both Ti and Pt migrated.

Image of FIG. 5.
FIG. 5.

The temperature distribution simulation results on a current carrying nanowire.

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/content/aip/journal/jap/105/12/10.1063/1.3151965
2009-06-19
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Failure mechanism analysis of electromigration dominated damage in TiSi2 nanowires
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/12/10.1063/1.3151965
10.1063/1.3151965
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