Snapshot of Fe, Co, and Ni atoms after deposition on Al(001) up to 10 ML at 300 K with 0.1 eV incident energy. (a) Fe/Al(001), (b) Co/Al(001), and (c) Ni/Al(001).
PCF (in arbitrary unit) of deposited Fe, Co, and Ni layers on Al(001) substrate for interfacial region. (a) Fe/Al(001), (b) Co/Al(001), and (c) Ni/Al(001).
Layer coverage fraction of (a) Fe (Ref. 14), (b) Co (Ref. 15), and (c) Ni atoms with 0.1 eV on Al(001) surfaces at 300 K along the -axis direction. Totally, 10 ML of each adatoms were deposited on Al(001) surface. The central solid line corresponds to the surface of Al substrate prior to the deposition. Layer coverage fraction represents the intermixing ratio for deposited Fe, Co, and Ni atoms and Al substrate atoms in each layer.
Sequential schematic diagram for Ni atom deposited on the bridge site of the Al(001) substrate. The incorporation path of the Ni adatom on (a) the bridge site of Al(001) surface is from [(b) and (c)] a subsurface interstitial site to [(d) and (e)] a substitutional site. H, B, and O represents hollow, bridge, and on top site, respectively.
Calculated mixing ratio and incorporation energy barrier.
Locally accelerated energy measured at various adsorption site of Al(001) surface (eV).
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