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Epitaxial growth of 20 nm InAs and GaAs quantum dots on GaAs through block copolymer templated masks
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10.1063/1.3082494
/content/aip/journal/jap/105/5/10.1063/1.3082494
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/5/10.1063/1.3082494
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic and top view SEM image of a GaAs substrate with SiO2 mask patterned through block copolymer lithography. (b) Schematic and top view SEM image of the substrate subsequent to pregrowth cleaning and mask removal.

Image of FIG. 2.
FIG. 2.

(a) Schematic of MBE sample holder with variable temperature gradient. Top view SEM images at various growth temperatures: (b) (no deposition), (c) (selective growth), (d) (selective growth), and (e) (nonselective growth).

Image of FIG. 3.
FIG. 3.

Schematic and top view SEM images of (a) nonselective growth with deposition on the mask and inside the pores before mask removal and (b) after mask removal.

Image of FIG. 4.
FIG. 4.

Schematic and top view SEM images of (a) nanopatterned grown InAs QDs subsequent to template removal: Diameter= nm, density= and (b) SK QDs: Diameter= . nm, density=

Image of FIG. 5.
FIG. 5.

(a) TEM and EDS line profile of nanopatterned grown QDs revealing subsurface nucleation of InAs. (White arrow in image indicates scan direction for line profile). HRTEM images of InAs QDs grown for (b) 387 and (c) 774 s, reveal the presence of twinning defects.

Image of FIG. 6.
FIG. 6.

Homoepitaxial nanopatterned growth of GaAs QDs on GaAs: (a) top view SEM and (b) HRTEM images.

Image of FIG. 7.
FIG. 7.

(a) PL curves of nanopatterned and SK QDs at 7.5 K. In the case of nanopatterned QDs, the PL intensity has been multiplied by 5. (b) Integrated PL intensities of nanopatterned and SK QDs as a function of temperature.

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/content/aip/journal/jap/105/5/10.1063/1.3082494
2009-03-06
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Epitaxial growth of 20 nm InAs and GaAs quantum dots on GaAs through block copolymer templated SiO2 masks
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/5/10.1063/1.3082494
10.1063/1.3082494
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