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Mechanism for low-etching resistance and surface roughness of ArF photoresist during plasma irradiation
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10.1063/1.3089245
/content/aip/journal/jap/105/5/10.1063/1.3089245
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/5/10.1063/1.3089245
/content/aip/journal/jap/105/5/10.1063/1.3089245
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/content/aip/journal/jap/105/5/10.1063/1.3089245
2009-03-12
2014-09-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanism for low-etching resistance and surface roughness of ArF photoresist during plasma irradiation
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/5/10.1063/1.3089245
10.1063/1.3089245
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