Saturation magnetization and uniaxial perpendicular anisotropy energy as functions of partial pressure during sputtering.
Anisotropy field and coercivity as functions of partial pressure.
Loop slope at , as function of partial pressure.
TEM micrographs of multilayer films (a) sputtered without and (b) with of .
Magnetization loops of conventional granular film and optimized multilayer film formed on the same seed layers.
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