Procedures for synthetic nanoparticle fabrication: (a) template formation by nanoimprint lithography, (b) residue layer removal by plasma, (c) undercut profile creation in the underlayer resist, (d) metal film deposition, and (e) lift-off followed by (f) chemically etching release layer.
SEM images of 120 nm CoFe nanoparticles (a) bound to the substrate and (b) after release and collection in aqueous solution. (c) TEM image of released nanoparticles with the structure of Ta 5/Ru 2/Co–Fe 12/Ru 2.5/Co–Fe 12/Ru 2/Ta5 (thicknesses in nanometers) and (d) the corresponding size distribution.
(a) loops of 120 nm diameter SAF nanoparticles with the structure of Ta 5/Ru 12/Ru 12/Ru 2/Ta 5 (in nanometers). (b) Susceptibility (normalized by the mass of ) vs in-plane applied field demonstrating tunability of the susceptibility through interlayer magnetic interactions. The structures of the samples are listed with total thickness in nanometers: curve A (circle): Ta 5/Ru 2/CoFe 6/Ru 2.5/CoFe 6/Ru 2/Ta 5, total of 28.5 nm; curve B (triangle): Ta 5/Ru 2/CoFe 6/Ru 0.6/CoFe 6/Ru 2/Ta 5, total of 26.6 nm; and curve C (square): Ta 5/Ru 2/[CoFe 3/Ru 0.6]3/CoFe 3/Ru 2/Ta 5, total of 27.8 nm.
Process flow showing three steps for nanosphere lithography fabrication of stamps. (a)–(c) are the corresponding SEM images.
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