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Synthetic antiferromagnetic nanoparticles with tunable susceptibilities
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10.1063/1.3072028
/content/aip/journal/jap/105/7/10.1063/1.3072028
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/7/10.1063/1.3072028
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Figures

Image of FIG. 1.
FIG. 1.

Procedures for synthetic nanoparticle fabrication: (a) template formation by nanoimprint lithography, (b) residue layer removal by plasma, (c) undercut profile creation in the underlayer resist, (d) metal film deposition, and (e) lift-off followed by (f) chemically etching release layer.

Image of FIG. 2.
FIG. 2.

SEM images of 120 nm CoFe nanoparticles (a) bound to the substrate and (b) after release and collection in aqueous solution. (c) TEM image of released nanoparticles with the structure of Ta 5/Ru 2/Co–Fe 12/Ru 2.5/Co–Fe 12/Ru 2/Ta5 (thicknesses in nanometers) and (d) the corresponding size distribution.

Image of FIG. 3.
FIG. 3.

(a) loops of 120 nm diameter SAF nanoparticles with the structure of Ta 5/Ru 12/Ru 12/Ru 2/Ta 5 (in nanometers). (b) Susceptibility (normalized by the mass of ) vs in-plane applied field demonstrating tunability of the susceptibility through interlayer magnetic interactions. The structures of the samples are listed with total thickness in nanometers: curve A (circle): Ta 5/Ru 2/CoFe 6/Ru 2.5/CoFe 6/Ru 2/Ta 5, total of 28.5 nm; curve B (triangle): Ta 5/Ru 2/CoFe 6/Ru 0.6/CoFe 6/Ru 2/Ta 5, total of 26.6 nm; and curve C (square): Ta 5/Ru 2/[CoFe 3/Ru 0.6]3/CoFe 3/Ru 2/Ta 5, total of 27.8 nm.

Image of FIG. 4.
FIG. 4.

Process flow showing three steps for nanosphere lithography fabrication of stamps. (a)–(c) are the corresponding SEM images.

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/content/aip/journal/jap/105/7/10.1063/1.3072028
2009-02-06
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Synthetic antiferromagnetic nanoparticles with tunable susceptibilities
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/7/10.1063/1.3072028
10.1063/1.3072028
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