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Planarization of amorphous carbon films on patterned substrates using gas cluster ion beams
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10.1063/1.3073665
/content/aip/journal/jap/105/7/10.1063/1.3073665
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/7/10.1063/1.3073665
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Experimental procedures.

Image of FIG. 2.
FIG. 2.

Surface morphology and cross-section profile of AFM before and after Ar-GCIB irradiation with acceleration energy of 20 keV. The ion doses were (b) and (c) .

Image of FIG. 3.
FIG. 3.

Cross-sectional TEM view of grooves on amorphous carbon after irradiation of Ar-GCIB (acceleration energy: 20 keV; ion dose: and ).

Image of FIG. 4.
FIG. 4.

Dependence of the reduction in carbon roughness power spectral intensity on groove interval.

Image of FIG. 5.
FIG. 5.

EDS of (a) amorphous carbon and (b) magnetic layer after Ar-GCIB irradiation with an ion dose of .

Image of FIG. 6.
FIG. 6.

Cross-sectional TEM image of the patterned Si with carbon overcoat after Ar-GCIB irradiation (acceleration ; ion ). AFM images of before and after Ar-GCIB irradiation are also presented.

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/content/aip/journal/jap/105/7/10.1063/1.3073665
2009-04-01
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Planarization of amorphous carbon films on patterned substrates using gas cluster ion beams
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/7/10.1063/1.3073665
10.1063/1.3073665
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