XRD patterns of ITO films deposited under various oxygen flow ratios . The halo pattern observed around was from the glass substrate.
Thermoreflectance signals of the Mo/ITO/Mo three-layered thin films deposited under 100% Ar. An flow ratio of 5% obtained by the nanosecond thermoreflectance measurements.
Thermal diffusivity of ITO films as a function of flow ratio during the depositions.
Thermal conductivity vs electrical conductivity for ITO films deposited at various flow ratios. The thermal conductivity calculated using the Wiedemann–Franz law is also shown by a dotted line. For comparison, the thermal conductivity of the amorphous IZO film is also plotted by open circles (Ref. 2).
Young’s modulus of the polycrystalline ITO film with a thickness of 200 nm obtained by a nanoindenter.
Resistivity and carrier density for ITO thin films as a function of flow ratios during the depositions.
Electrical conductivity , thermal conductivity , and electrical contribution to thermal conductivity for ITO thin films estimated from the Wiedemann–Franz law.
The phonon mean free path calculated using the density of (Ref. 11), Young’s modulus , and average phonon velocity . For comparison, the for the amorphous IZO films is also shown (Ref. 2).
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