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Plasma “anti-assistance” and “self-assistance” to high power impulse magnetron sputtering
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View: Figures


Image of FIG. 1.
FIG. 1.

Experimental setup: (a) sideview of the 1m diameter cylindrical chamber, with position of the components approximately to scale; the magnetron discharge was assisted by a CPS; (b) top view of the discharge region, with the plasma schematically indicated.

Image of FIG. 2.
FIG. 2.

Example of a time-dependent, medium-length HiPIMS current pulse, at constant voltage, with a Nb-target at an argon pressure of 0.4 Pa.

Image of FIG. 3.
FIG. 3.

Current pulses (bottom) at constant chamber pressure of 0.12 Pa and nominally constant voltage pulses (top) for different pulse repetition rates ( Nb target, argon gas).

Image of FIG. 4.
FIG. 4.

Peak current-constant voltage characteristics for constant pulse length of and different pulse repetition rates ( Nb target, argon gas at 0.12 Pa).

Image of FIG. 5.
FIG. 5.

Lower limit of gas pressure needed for stable pulsed magnetron operation with the boundary conditions of 1000 V maximum voltage, 1000 W maximum average power, and pulse length ( Nb target, argon gas).


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma “anti-assistance” and “self-assistance” to high power impulse magnetron sputtering