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Deposition of silicon dioxide films using an atmospheric pressure microplasma jet
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10.1063/1.3108541
/content/aip/journal/jap/105/8/10.1063/1.3108541
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/8/10.1063/1.3108541
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Figures

Image of FIG. 1.
FIG. 1.

Schematic experimental setup. An argon flow in the range of 0.2–10 SCCM transports TMS or HMDSO from a bubbler into the central capillary electrode of a microplasma jet. A indicates the position of precursor injection into the argon plasma jet. is the distance between the end of the microplasma source and the substrate.

Image of FIG. 2.
FIG. 2.

FTIR spectra for films deposited from TMS at a substrate temperature of with varying admixture of , as indicated.

Image of FIG. 3.
FIG. 3.

FTIR spectra for films deposited from TMS with an admixture of 10 SCCM at varying substrate temperature, as indicated.

Image of FIG. 4.
FIG. 4.

Films deposited from TMS with an admixture of 10 SCCM at varying substrate temperature: (a) OH peak area, (b) ratio of the AS1 vs AS2 peak areas, and (c) deposition rate on axis as measured by profilometry.

Image of FIG. 5.
FIG. 5.

FTIR spectra of deposited films for different HMDSO flow rates, as indicated. No is added to the plasma.

Image of FIG. 6.
FIG. 6.

Evolution of the SiOSi asymmetric stretching AS1 peak position (solid square) and FWHM (open circle) with respect to the HMDSO flow rate. The lines are a guide to the eyes.

Image of FIG. 7.
FIG. 7.

Evolution of the oxygen-to-silicon ratio and the carbon concentration of films deposited from pure HMDSO at varying HMDSO flow rates. The lines are a guide to the eyes.

Image of FIG. 8.
FIG. 8.

Dependence of the overall growth rate on distance between plasma and sample, as measured by the quartz microbalance for films deposited at varying HMDSO flow rates.

Image of FIG. 9.
FIG. 9.

FTIR spectra of deposited films for HMDSO flow rate of 0.5 SCCM at varying distances , as indicated. The spectra are normalized to the maximum peak height and shifted with respect to each other.

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/content/aip/journal/jap/105/8/10.1063/1.3108541
2009-04-21
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Deposition of silicon dioxide films using an atmospheric pressure microplasma jet
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/8/10.1063/1.3108541
10.1063/1.3108541
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