AFM image of the surface (image size is ; the maximal height difference between the black and white points is 2.8 nm).
Measured curves of fabricated MIS capacitors, completed by the data of Refs. 4 and 9–11. The lines serve as a guide for eyes.
Measured and with equilibrium approach simulated curves.
Individual current components.
Measured and simulated within diode approach curves, reverse bias. Excessive minority carrier generation is additionally assumed.
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