Examples of typical molecular structure for (a) 248 nm PR based on polyhydroxystryrene and (b) 193 nm PRs based on methacrylate structure.
XPS C spectra before and after various cure plasma treatment times: (a) HBr cure and (b) Ar cure.
FTIR spectra (carbonyl region ) before and after various cure plasma treatment times: (a) HBr cure and (b) Ar cure.
Comparison of FTIR spectra (carbonyl region ) of Ar and HBr plasma cured PRs with PR film baked at .
Thermal deprotection mechanism for methacrylate based PR.
Raman spectra in the region before and after plasma treatment: (a) HBr plasma and (b) Ar plasma.
Dispersive laws [ and ] obtained for the top graphitized layers formed after HBr or Ar plasma cure treatments.
Evolution of the refractive index, of the bottom modified PR layer with plasma treatment processing times: (a) HBr cure and (b) Ar cure.
Evolution of the extinction coefficient of the bottom modified PR layer with plasma treatment processing times: (a) HBr cure and (b) Ar cure.
Comparison of the experimental data with the fitting model in the case of 100 s HBr cure plasma treatment.
Evolution with the HBr and Ar plasma processing times of the thicknesses of: (a) the top graphitized layer and (b) the total resist film.
Correlation between the resist film thickness loss and the lactone absorbance decrease.
Glass transition temperature before and after Ar and HBr cure plasma treatments determined by DMAs.
FTIR analyses of PR films exposed to (a) HBr and (b) Ar cure plasma treatments. FTIR analyses are performed on PR films directly exposed to cure plasma treatment (no window) and on PR exposed to plasma VUV light only through windows with different cutoff wavelength (LiF: , : , : , KCl: , and glass: ).
Comparison of Raman spectra in the region of a reference resist sample, HBr cured resist, and HBr cured resist through window.
Atomic chemical composition of the resist surface (10 nm) before and after 60 s Ar and HBr cure plasma treatments obtained by XPS.
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