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Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists
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10.1063/1.3116504
/content/aip/journal/jap/105/9/10.1063/1.3116504
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/9/10.1063/1.3116504

Figures

Image of FIG. 1.
FIG. 1.

Examples of typical molecular structure for (a) 248 nm PR based on polyhydroxystryrene and (b) 193 nm PRs based on methacrylate structure.

Image of FIG. 2.
FIG. 2.

XPS C spectra before and after various cure plasma treatment times: (a) HBr cure and (b) Ar cure.

Image of FIG. 3.
FIG. 3.

FTIR spectra (carbonyl region ) before and after various cure plasma treatment times: (a) HBr cure and (b) Ar cure.

Image of FIG. 4.
FIG. 4.

Comparison of FTIR spectra (carbonyl region ) of Ar and HBr plasma cured PRs with PR film baked at .

Image of FIG. 5.
FIG. 5.

Thermal deprotection mechanism for methacrylate based PR.

Image of FIG. 6.
FIG. 6.

Raman spectra in the region before and after plasma treatment: (a) HBr plasma and (b) Ar plasma.

Image of FIG. 7.
FIG. 7.

Dispersive laws [ and ] obtained for the top graphitized layers formed after HBr or Ar plasma cure treatments.

Image of FIG. 8.
FIG. 8.

Evolution of the refractive index, of the bottom modified PR layer with plasma treatment processing times: (a) HBr cure and (b) Ar cure.

Image of FIG. 9.
FIG. 9.

Evolution of the extinction coefficient of the bottom modified PR layer with plasma treatment processing times: (a) HBr cure and (b) Ar cure.

Image of FIG. 10.
FIG. 10.

Comparison of the experimental data with the fitting model in the case of 100 s HBr cure plasma treatment.

Image of FIG. 11.
FIG. 11.

Evolution with the HBr and Ar plasma processing times of the thicknesses of: (a) the top graphitized layer and (b) the total resist film.

Image of FIG. 12.
FIG. 12.

Correlation between the resist film thickness loss and the lactone absorbance decrease.

Image of FIG. 13.
FIG. 13.

Glass transition temperature before and after Ar and HBr cure plasma treatments determined by DMAs.

Image of FIG. 14.
FIG. 14.

FTIR analyses of PR films exposed to (a) HBr and (b) Ar cure plasma treatments. FTIR analyses are performed on PR films directly exposed to cure plasma treatment (no window) and on PR exposed to plasma VUV light only through windows with different cutoff wavelength (LiF: , : , : , KCl: , and glass: ).

Image of FIG. 15.
FIG. 15.

Comparison of Raman spectra in the region of a reference resist sample, HBr cured resist, and HBr cured resist through window.

Tables

Generic image for table
Table I.

Atomic chemical composition of the resist surface (10 nm) before and after 60 s Ar and HBr cure plasma treatments obtained by XPS.

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/content/aip/journal/jap/105/9/10.1063/1.3116504
2009-05-05
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/9/10.1063/1.3116504
10.1063/1.3116504
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