1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists
Rent:
Rent this article for
USD
10.1063/1.3116504
/content/aip/journal/jap/105/9/10.1063/1.3116504
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/9/10.1063/1.3116504
/content/aip/journal/jap/105/9/10.1063/1.3116504
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/jap/105/9/10.1063/1.3116504
2009-05-05
2014-07-29
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/9/10.1063/1.3116504
10.1063/1.3116504
SEARCH_EXPAND_ITEM