Plan-view and cross-sectional scanning electron micrographs from [(a) and (d)] Ta, [(b) and (e)] Cr, and [(c) and (f)] Al nanorod layers grown by GLAD at .
Plan-view and cross-sectional micrographs from Ta nanorods grown at [(a) and (d)] 200, [(b) and (e)] 500, and [(c) and (f)] .
(a) Plot of nanorod width at a height of 400 nm vs homologous temperature . Triangles represent data from other published reports.6,40–45 (b) The same data as in (a) plotted as double logarithm of vs inverse homologous temperature , including independent linear fits for high and low-temperature regimes. (c) Variation in the composite constant vs obtained from Eq. (7) and the low- and high- fits in (b) for various values of the critical island size and dimensionality of adatom transport .
Comparison of obtained from the nanorod analysis with reported activation energies for various low-index metal surfaces.17,60–68
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