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Femtosecond laser-induced shockwave formation on ablated silicon surface
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10.1063/1.3122047
/content/aip/journal/jap/105/9/10.1063/1.3122047
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/9/10.1063/1.3122047
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Laser irradiation (a) immediately after first pulse and (b) before the arrival of the next pulse.

Image of FIG. 2.
FIG. 2.

[(a)–(c)] Repetition rates of 8.67, 13, and 26 MHz, respectively.

Image of FIG. 3.
FIG. 3.

Surface temperature evaluation at increasing repetition rate.

Image of FIG. 4.
FIG. 4.

Illustration of primary and secondary rims observed at 13 MHz, 0.25 ms.

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/content/aip/journal/jap/105/9/10.1063/1.3122047
2009-05-04
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Femtosecond laser-induced shockwave formation on ablated silicon surface
http://aip.metastore.ingenta.com/content/aip/journal/jap/105/9/10.1063/1.3122047
10.1063/1.3122047
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