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Influence of morphology on high-order harmonic generation enhancement in fullerene-containing plasma
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View: Figures


Image of FIG. 1.
FIG. 1.

Experimental scheme. PP, prepulse; FP, femtosecond pulse; T, fullerene-containing target; FL, focusing lenses; and XUVS, XUV spectrometer.

Image of FIG. 2.
FIG. 2.

(a) HRTEM image of powder agglomerate before the deposition; (b) HRTEM image of deposited debris of after strong excitation of fullerene-containing target. The scale lengths on the images correspond to 2 nm. In the insets, the Fourier transform patterns of the crystalline nanopowder and debris are shown.

Image of FIG. 3.
FIG. 3.

Comparison of harmonic intensity in the cases of (a) fullerene plasma and (b) In plasma. One can see the equality between the resonance-induced enhancement of the 13th harmonic generating in indium plasma and the group of harmonics from fullerene plasma in the range of SPR of .

Image of FIG. 4.
FIG. 4.

Variation of the harmonic spectrum from plasma after 1, 18, 26, 40, and 90 shots on the same spot of the surface of fullerene powder-containing target.

Image of FIG. 5.
FIG. 5.

Harmonic spectrum from fullerene plasma plume in the vicinity of the SPRs of and (55–65 nm) and beyond.

Image of FIG. 6.
FIG. 6.

Spectrum of the ninth harmonic from fullerene plasma plume in the cases of chirp-free 48 fs pulses (solid line), positively chirped 160 fs pulses (dashed-dotted line), and negatively chirped 160 fs pulses (dashed line).

Image of FIG. 7.
FIG. 7.

(a) Spectrum of the incident fundamental radiation (curve 1), and (b) spectrum after propagation through the 10 mm thick glass slab at an intensity of (curve 2).


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of C60 morphology on high-order harmonic generation enhancement in fullerene-containing plasma