The SEM images of (a) 500 nm PS NS monolayer and Si NRAs with (b) 303 nm, (c) 200 nm, and (d) 145 nm in diameters. (e) The etching time of oxygen plasma for PS vs the diameter of PS.
(a) Total reflectance over a range from 350 to 850 nm for diameter-controlled NRAs. The root mean square roughness is plotted as a function of the filling factor, which is related to the diameter of NRAs.
The reflectance of diameter-controlled NRAs as a function of AOI using (a) unpolarized and (b) s-, and (c) p-polarized lights with 650 nm wavelength. (d) The reflectance ratio of polarization as a function of AOI.
The CAs for the diameter-controlled NRAs. The insets are corresponding photographs of water droplets on the surfaces of Si NRA layers.
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